Page - 201 - in Technologien für das Lichtmanagement in organischen Leuchtdioden

Literaturverzeichnis [176] W. F. van Dorp, C. W. Hagen, “A critical literature review of focusedelectronbeaminduceddeposition,”JournalofAppliedPhysics, vol. 104,no.8,p.081301,2008. [177] D.E.Wolfe. JSingh, “Titaniumcarbidecoatingsdepositedby reactive ion beam-assisted, electron beam-physical vapor deposition,” Surface andCoatingsTechnology, vol. 124,no.2,pp.142–153,2000. [178] B.Bhushan, ed.,HandbookofNanotechnology. Springer, 2004. [179] S.-H.Chen, “Work-function changes of treated indium-tin-oxide films for organic light-emitting diodes investigated using scanning surface- potential microscopy,” Journal of Applied Physics, vol. 97, no. 7, p.073713,2005. [180] D. J. Milliron, I. G. Hill, C. Shen, A. Kahn, J. Schwartz, “Surface oxidation activates indium tin oxide for hole injection,” Journal of AppliedPhysics, vol. 87,pp.572–576, JAN12000. [181] Z. Z. You, J. Y. Dong, “Surface properties of treated ito anodes for organic light-emitting devices,” Applied Surface Science, vol. 249, pp.271–276,AUG152005. [182] F. Kurdesau, G. Khripunov, A.F. da Cunha, M. Kaelin, A.N. Tiwari, “Comparative study of ito layers deposited by dc and rf magnetron sputtering at room temperature,” Journal of Non-Crystalline Solids, vol. 352,pp.1466–1470,2006. [183] R.N. Joshi, V.P. Singh, J.C. McClure, “Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering,”Thin Solid Films, vol. 257,no.1,pp.32–35,1995. [184] M.Mizuhashi,“Electricalpropertiesofvacuum-depositedindiumoxide andindiumtinoxidefilms,”ThinSolidFilms,vol.70,no.1,pp.91–100, 1980. 201