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3.3.1. PhononModeVariations inZnO
Differences in ε for theZnOareexpectedwhenover-coatedwitha-Si:H.PECVD
of a-Si:H raises the temperature of ZnO to 200˝C and exposes it to hydrogen
in the plasma. There are many studies on the growth and various effects of
annealing on the optical and structural properties of ZnO layers [65–70]. It is
well known that the properties of ZnO layers are strongly affected by not only
the deposition conditions but also the post-deposition annealing conditions or
temperature treatments. Annealing has a large effect on the crystallinity of the
layers in termsofgrainsize, residualstrain,andthedefectdensityascomparedto
as-depositedfilms. AsnotedinTable5, theamplitudeof theCPPBoscillatorsofZnO
over-coatedwitha-Si:Harefittoaccountforchangesin εoccurringduringPECVDof
the a-Si:H layers. The increase in amplitude for higher energy absorption features in
εandthedecrease infilmthicknesscomparedtothesamplewithouta-Si:Hcoatingat
T = 200˝C indicate that the as-deposited ZnO film densifies and increases the degree
of crystallinityafter annealingat thea-Si:H depositiontemperature. Thesevariations
are generally consistent with literature [69,70], in that the imaginary component
of the optical response related to electronic transitions increases in amplitude and
sharpens. However, Liu et al. reports a decrease in the real part of the complex index
of refraction in the transparent region,whichtheyattribute tovoidformingalong
withlargercrystallinegrains. Inoursamples,voidformationisnotobservedoptically,
however thedecrease in thickness implies thatcrystallitegrowthhasoccurredwhich
coupled with the higher observed real part of ε indicates that this film is now overall
moredenselypacked. Thecomparisonofdifferentphononmodes inZnOwithand
withouta-Si:HcoatingisshowninFigure9. ThecharacteristicTOmodeswithA1 and
E1 symmetryat0.0467eV(376.66cm´1)and0.0506eV(408.12cm´1)arepresentand
able toberesolved[51–53]. Thevibrationalmodeat0.0847eV(683.15cm´1) canbe
attributed to longitudinal optical (LO) mode with E1 symmetry [52]. The orientation
ofgrains inthefilmcouldbeareasonforshiftingofmodestoslightlyhigheror lower
wavenumbers. The splitting of the peak observed at 404 cm´1 for the uncoated ZnO
into twoexpectedpeaksat377and408cm´1 forZnOover-coatedwitha-Si:Hand
appearanceofthe683cm´1 modeislikelyduetograinsizeincreasesorareductionin
defectdensityfromannealingatthea-Si:Hdepositiontemperatureof200˝C[68]. The
increase in amplitude for ε2 of phonon mode at 408 cm´1 also supports the idea that
grain restructuring and material densification occurs. The presence of an additional
absorptionmodeat1306.62cm´1 (0.162eV)canbeassociatedwithoxygen-hydrogen
(O-H) bonds in the thin film, such as the formation of zinc hydroxide or absorbed
water or stretching modes of hydrogen bonded to heavier elements like zinc [54].
The large broadening of this absorption peak could be due to the modification or
damageto theZnOasaresultofexposure tohydrogenin theplasma.
86
Photovoltaic Materials and Electronic Devices
- Title
- Photovoltaic Materials and Electronic Devices
- Author
- Joshua M. Pearce
- Editor
- MDPI
- Location
- Basel
- Date
- 2016
- Language
- English
- License
- CC BY-NC-ND 4.0
- ISBN
- 978-3-03842-217-4
- Size
- 17.0 x 24.4 cm
- Pages
- 216
- Keywords
- Perovskite, Plasmonics, Nanostructured Materials, Anti-Reflection Coatings, Transparent Conductive Oxides, Amorphous Silicon, Dye-sensitized Solar Cells (DSSCs) Materials, Organic Photovoltaic Materials, Solar Energy Materials
- Categories
- Naturwissenschaften Physik
- Technik