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Table 2. Parameters describing complex dielectric function (ε = ε1 + iε2) and
structure for a semi-infinite Ag film on a borosilicate glass over coated by Cr
beforeZnOdeposition. Experimentalellipsometricspectrawerecollected in situ
after deposition at room temperature in the spectral range from 0.734 to 5.88 eV
andfitusing least squareregressionanalysiswithanunweightedestimatorerror
function,σ= 5ˆ10´3. For bulk Ag, the parameterization of ε consisted of a Drude
oscillator, two oscillators assuming critical point parabolic bands (CPPB), and a
constant additive term to ε1 denoted ε8. Spectra in ε for the 30˘ 2 Å surface
roughness layerwereparameterizedwith twoLorentzoscillatorsand ε8=1.
AgSurfaceRoughness
Oscillator A(Unitless) Γ (eV) E0 (eV) - -
Lorentz 4.2˘0.2 2.5˘0.1 5.17˘0.02 - -
Lorentz 1.0˘0.3 0.06˘0.03 3.61˘0.01 - -
BulkAg
Oscillator A(Unitless) Γ (eV) En (eV)
Figure 1. Complex dielectric function spectra, ε = ε1 + iε2, (arrow pointing left for ε1 axis, arrow
pointing right for ε2 axis) from 0.734 to 5.88 eV for a semi‐infinite Ag film parameterized with a
combination
of
a
Drude
oscillator
and
two
oscillators
assuming
critical
point
parabolic
bands
(CPPB)
with parameters listed in
Table 2.
Table 2. Parameters describing complex dielectric function (ε = ε1 + iε2) and structure for a
semi‐infinite Ag film on a borosilicate glass over coated by Cr before ZnO deposition. Experimental
ellipsometric
spectra
were
collected
in
situ
after
deposition
at
room
temperature
in
the
spectral
range
from 0.734 to 5.88 eV and fit using least square regression analysis with an unweighted estimator
error
function,
=
5
×
10−3.
For
bulk
Ag,
the
parameterization
of
ε
consisted
of
a
Drude
oscillator,
two
oscillators
assuming
critical
point
parabolic
ban s
(CPPB),
and
a
constant
additive
term
to
ε1
denoted
ε
. Spectra in ε for the 30 ± 2 Å surface roughness layer were parame erized with two Lorentz
oscillators and
ε
= 1.
Ag Surface Roughness
Oscillator A (Unitless) (eV) E0 (eV) ‐ ‐
Lorentz 4.2 ± 0.2 2.5 ± 0.1 5.17 ± 0.02 ‐ ‐
Lorentz 1.0 ± 0.3 0.06 ± 0.03 3.61 ± 0.01 ‐ ‐
Bulk
Ag
Oscillator A (Unitless) (eV) En ( ) Ө (degrees) μ
CPPB 5.29 ± 0.09 0.70 ± 0.03 3.845 ± 0.008
180.306 ± 0.002 0.5
CPPB 10.39 ± 0.07 0.87 ± 0.01 4.025 ± 0.001
7.0 ± 0.4 0.5
Drude (Ωcm) (fs)
Constant additive term to ε1 3.02 ± 0.03 × 10−6 16.7 ± 0.1
ε 1.632 ± 0.008 egre s) µ
CPPB 5.29˘0.09 0.70˘0.03 3.845˘0.008 ´180.306˘0.002 0.5
CPPB 10.39˘0.07 0.87˘0.01 4.025˘0.001 ´7.0˘0.4 0.5
Drude ρ (Ωcm) τ (fs)
Constantadditive termtoε1 3.02˘0.03ˆ10´6 16.7˘0.1
ε8 1.632˘0.008
The structural model for the ZnO/Ag BR in the energy range 0.734 to 5 eV
consisted of a semi-infinite Ag metal layer deposited onto glass, a 108˘10 Å ZnO +
Aginterfacial layer,a 3059˘3Å bulkZnOlayer,anda80˘1Åsurfaceroughness
representedusingBruggemaneffectivemediumapproximationof0.5ZnOand0.5
voidvolumefractions. Parametricexpressionswereusedtodescribe ε forAg,ZnO,
and the ZnO + Ag interface and are listed in Tables 2 and 3. Previous studies of
ZnO/Ag interfaces in the BR of thin film n-i-p a-Si:H PV shows that the optically
determined value of Ag surface roughness obtained from RTSE is very close to
that measured with atomic force microscope (AFM) with ds,RTSE (Å) = 0.96 ds,AFM
(Å) + 5 Å [28]. The ds,RTSE = 30˘2 Å for Ag corresponds to a ds,AFM =26Å. After
depositionofZnO, theZnO/Aginterface layer thickness is reportedbyDahal et al.
as di (Å) = 1.98 ds (Å) + 17.5 Å. The interface layer thickness predicted from the
Ag surface roughness in this work is 76.9 Å as compared to that obtained in our
parametricanalysisof108Å[28]. Ourparametricvalueslightlyoverestimates the
prediction,howeverinDahaletal.[28]thesampleswithsimilarAgsurfaceroughness,
25–30 Å, also has an interface thickness of 75–110 Å which are greater than the linear
prediction. Figure2showsthat thespectra in εobtainedfor theZnO+Aginterface
is optically different than Ag and ZnO alone and can be modeled by a Lorentz
oscillator and a Drude oscillator in the near IR to near UV range (0.734 to 5 eV) with
ε8=1. TheZnO+Aginterfaceexhibitsaclear localizedparticleplasmonabsorption
feature whichcan bemodeled using aLorentz oscillatorwith a resonanceenergy at
2.83˘0.01 eV [27,48]. A resistivity of 3.7˘0.5ˆ10´5Ωcm and a scattering time of
73
Photovoltaic Materials and Electronic Devices
- Titel
- Photovoltaic Materials and Electronic Devices
- Autor
- Joshua M. Pearce
- Herausgeber
- MDPI
- Ort
- Basel
- Datum
- 2016
- Sprache
- englisch
- Lizenz
- CC BY-NC-ND 4.0
- ISBN
- 978-3-03842-217-4
- Abmessungen
- 17.0 x 24.4 cm
- Seiten
- 216
- Schlagwörter
- Perovskite, Plasmonics, Nanostructured Materials, Anti-Reflection Coatings, Transparent Conductive Oxides, Amorphous Silicon, Dye-sensitized Solar Cells (DSSCs) Materials, Organic Photovoltaic Materials, Solar Energy Materials
- Kategorien
- Naturwissenschaften Physik
- Technik