Seite - 75 - in Photovoltaic Materials and Electronic Devices
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electronic transitions, Lorentz oscillators representing IR phonon modes, and a
constant real additive term ε8 to account for dispersion from absorption features
outside the measured spectral range from 0.04 to 5 eV with parameters given in
Table 4. The near IR to near UV range shows only small absorption below the lowest
direct transitionat3.364eVasexpectedfordirectbandgapZnO[50]. Phononmodes
forwurtziteZnOareΓopt =1A1 +2B1 +1E1 +2E2,withA1 andE1 modesIR-active.
Onlyonecharacteristic transverseoptical (TO)modeforZnOwithE1 symmetryat
0.0501eV (404.08cm´1) is resolvedfor this sample [51–53]. Weakabsorptionbands
in the spectral region from 0.134 to 0.264 eV (1080 to 2130 cm´1) have been observed
andareoftenassociatedwithhydrogen-associatedbendingmodes; stretchingmodes
of hydrogen bonded to heavier elements like zinc; and various carbon, oxygen,
and nitrogen-related stretching modes not involving hydrogen [54]. These types
of peaks are analogous to those found in the absorbance spectra from traditional
unpolarized FTIR measurements, which lack sensitivity to discerning thickness and
thefullcomplexopticalpropertiessimultaneously—acapabilityofSEmeasurements.
Table 3. Parameters describing εand structure for a ZnO film deposited on Ag and
the ZnO + Ag interface formed. Experimental ellipsometric spectra were collected
in situ after deposition at room temperature in the spectral range from 0.734 to
5.0 eV and fit using least squares regression analysis with an unweighted estimator
errorfunction,σ=7ˆ10´3. Parametersdescribing ε forAgwerefixedfromTable2.
ForZnO, theparameterizationof εconsistedof twoCPPBoscillators,aSellmeier
oscillator, and ε8. For theZnO +Aginterface, theparameterization of εconsisted
ofaDrudeoscillator,aLorentzoscillator,and ε8.
Layer Oscillators
ZnO
db =3060˘3Å
ds =80˘1Å CPPB(µ= 0.5) ε8= 2.27˘0.01
A(Unitless) Γ (eV) En (eV)
Materials
2016,
9,
128 9
of
23
Table 3. Parameters describing ε and structure for a ZnO film deposited on Ag and the ZnO + Ag
interface formed. Experimental ellipsometric spectra were collected in situ after deposition at room
temperature in the spectral range from 0.734 to 5.0 eV an fit using least squares r gression analysis
with an unweighted estim tor error function,
= 7 × 10−3. Parameters describing ε for Ag were fix d
from Table 2. For ZnO, the parameterization of ε consisted of two CPPB oscillators, a Sellmeier
oscillator, and ε
. For the ZnO + Ag interface, the parameterization of ε consisted of a Drude
oscillator, a
Lorentz oscillator, and ε
.
Layer Oscillators
ZnO
db = 3060 ± 3 Å
ds = 80 ± 1 Å CPPB (μ = 0.5) ε = 2.27 ± 0.01
A (Unitless)
(eV) En (eV) Ө (degrees)
2.63 ± 0.02 0.199 ± 0.002 3.363 ± 0.001
20.1 ± 0.5
1.41 ± 0.02 3.83 ± 0.08 4.36 ± 0.03 0 (fixed)
Sellmeier
A (eV2)
(eV) En (eV)
0.080 ± 0.002 ‐ 0
ZnO/Ag
Interface = 108
± 11 Å Lorentz ε = 1
A (Unitless)
(eV) E0 (eV)
2.8 ± 0.2 0.57 ± 0.05 2.83 ± 0.01
Drude
(
cm)
(fs)
3.7 ± 0.5 x10−5 2.7 ± 0.3
3.1.2.
Phonon Modes in ZnO
The analysis was extended to the IR by fitting parameters defining ε for ZnO only and fixing
those defining ε for Ag and the ZnO + Ag interface as well as the interface layer thickness. This
analysis approach was chosen because free carrier absorption represented by the Drude feature
dominates the IR response of Ag and the ZnO + Ag interface layers and is already established from
near IR to UV spectral range analysis. A common parameterization of ε for the ZnO was applied for
the data collected from the two instruments with spectral ranges from 0.04 to 0.734 eV and 0.734 to
5.0
eV,
respectively,
although
the
bulk
ZnO
layer
thickness
was
allowed
to
vary
for
the
ellipsometric
spectra collected from each respective instrument to account for measurement on different spots
over the sample surface. A common surface roughness thickness between the two sets of measured
spectra was obtained, as this effect will vary less with non‐uniformity than the overall bulk layer
thickness. Figure 3 shows ε for ZnO represented by a combination of CPPB oscillators for electronic
egre s)
2.63˘0.02 0.199˘0.002 3. 63˘0.001 ´ 0.1˘0.5
1.41˘0.02 3.83˘0.08 4.36˘0.03 0 (fixed)
Sellmeier
A(eV2) Γ (eV) En (eV)
0.080˘0.002 - 0
ZnO/Ag
Interface=108˘11Å Lorentz ε8= 1
A(Unitless) Γ (eV) E0 (eV)
2.8˘0.2 0.57˘0.05 2.83˘0.01
Drude
ρ (Ωcm) τ (fs)
3.7˘0.5x10´5 2.7˘0.3
75
Photovoltaic Materials and Electronic Devices
- Titel
- Photovoltaic Materials and Electronic Devices
- Autor
- Joshua M. Pearce
- Herausgeber
- MDPI
- Ort
- Basel
- Datum
- 2016
- Sprache
- englisch
- Lizenz
- CC BY-NC-ND 4.0
- ISBN
- 978-3-03842-217-4
- Abmessungen
- 17.0 x 24.4 cm
- Seiten
- 216
- Schlagwörter
- Perovskite, Plasmonics, Nanostructured Materials, Anti-Reflection Coatings, Transparent Conductive Oxides, Amorphous Silicon, Dye-sensitized Solar Cells (DSSCs) Materials, Organic Photovoltaic Materials, Solar Energy Materials
- Kategorien
- Naturwissenschaften Physik
- Technik