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5
5 2.911 10.0845 – 14Â
8 2.908 10.0764 – 19Â
3.1.2.Â
AFMÂ AnalysisÂ
Figure 2 shows the AFM surface topology of the ITO films deposited under three differentÂ
oxygen environments andÂ
etched for 1Â
min andÂ
8 min. Â
Â
Figure 2. Surface topology image for 2 μm × 2 μm × 0.2 μm of the ITO film deposited under variousÂ
oxygen environments: (A) 0 sccm oxygen, (B) 0.4 sccm oxygen, (C) 1.0 sccm oxygen, and etched for Â
8 min, (D) 0 sccm oxygen, (E) 0.4 sccm oxygen and (F) 1 sccm oxygen. (A–C) etched for 1 min and Â
(D–F) films etched for 8 min.Â
The etching was performed atÂ
room temperature. Â
Figure 2. Surface topology image for 2µ ˆ 2µmˆ 0.2µm of the ITO film
deposited under various oxygen environments: (A) 0 sccm oxygen; (B) 0.4 sccm
oxygen; (C) 1.0 sccm oxygen, and etched for 8 min; (D) 0 sccm oxygen; (E) 0.4 sccm
oxygenand(F)1sccmoxygen. (A–C) etchedfor1minand(D–F)filmsetchedfor
8min. Theetchingwasperformedat roomtemperature.
Figure 2A,B shows the ITO films deposited in an oxygen deficient ambient and
etchedfor1and8min, respectively. Spherical sizedgrainsareclearlyvisible inall
AFM images presented in Figure 2. There is variation of surface roughness of the
filmswithbothoxygenflowrateandetchingtimeof the ITOfilms. Theminimum
valueofsurfaceroughnessof0.65nmwasmeasuredfor ITOfilmssputteredusing
0.4sccmoxygenflowrateandetchedfor1min,whileamaximumsurfaceroughness
valueof8.9nmwasobservedforfilmsprocessedat1.0sccmoxygenflowrateand
etchedfor1min. Therewasaslight increaseinroughnesswithetchingtimeobserved
for 0 sccm and 0.4 sccm ITO film, for etching times 1 min to 8 min. However, the
1.0sccmfilms, showedthegreatestvariation insurfaceroughnessevenafter1min
etchingprocess. Generally, thesurfaceroughnessofthefilmsareobservedtoincrease
whentheoxygengasconcentration is increasedduringprocessing.
3.1.3. RamanSpectroscopy
Figure 3 shows the Raman spectrum for ITO deposited at various oxygen
compositionsandetchedat1,3,5and8minrespectively. Ramanspectroscopyisused
todetermine the structural conformationsof thematerials. Grouptheorypredicts
152
Photovoltaic Materials and Electronic Devices
- Titel
- Photovoltaic Materials and Electronic Devices
- Autor
- Joshua M. Pearce
- Herausgeber
- MDPI
- Ort
- Basel
- Datum
- 2016
- Sprache
- englisch
- Lizenz
- CC BY-NC-ND 4.0
- ISBN
- 978-3-03842-217-4
- Abmessungen
- 17.0 x 24.4 cm
- Seiten
- 216
- Schlagwörter
- Perovskite, Plasmonics, Nanostructured Materials, Anti-Reflection Coatings, Transparent Conductive Oxides, Amorphous Silicon, Dye-sensitized Solar Cells (DSSCs) Materials, Organic Photovoltaic Materials, Solar Energy Materials
- Kategorien
- Naturwissenschaften Physik
- Technik